2001-2005 [2005.07.08] Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing
2019.06.26 15:45
Hyun-Goo Kang, Myung-Yoon Lee, Hyung-Soon Park, Ungyu Paik and Jea-Gun Park
Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing