2011-2015 [2013.02.15] Effective Multi-step Ge Condensation Process Using Intermittent SiO2 Strip to Obtain a High-Ge Concentration and a Thick Ge-on-insulator (GeOI) Substrate for p-MOSFET
2021.08.12 13:39
Effective Multi-step Ge Condensation Process Using Intermittent SiO2 Strip to Obtain a High-Ge Concentration and a Thick Ge-on-insulator (GeOI) Substrate for p-MOSFET
Tae-Hyun Kim and Jea-Gun Park