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2011-2015 [2011.04.07] Effect of NH4OH Concentration on Surface Qualities of a Silicon Wafer after Final-Touch Polishing

2021.02.27 18:01

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Hee-Sub Hwang, Jin-Hyung Park, Eun-Suck Choi, Jin-Woo Ahn and Jea-Gun Park

Effect of NH4OH Concentration on Surface Qualities of a Silicon Wafer after Final-Touch Polishing

J. Electrochem. Soc. 158 (2011) H641

[231] J. Electrochem. Soc. 158 (2011) H641.pdf [File Size:1.10MB/Download:32]

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