222 |
[2010.06.01] Device Performance and Polymer Layer Morphology in Polymer Bistable Device (PBD): The Control of Physicochemical Properties of Solvent
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221 |
[2010.05.14] Effect of NiOx thin layer fabricated by oxygen-plasma treatment on polymer photovoltaic cell
|
220 |
[2010.04.27] Dependence of SOI Properties on Memory Characteristics in a Cap-less Memory Cell
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219 |
[2010.04.23] Capacitor-less memory-cell fabricated on nanoscale unstrained Si layer on strained SiGe layer-on-insulator
|
218 |
[2010.04.20] Multiselectivity Chemical Mechanical Polishing for NAND Flash Memories beyond 32 nm
|
217 |
[2010.03.23] Optimal Channel Ion Implantation for High Memory Margin of Capacitor-Less Memory Cell Fabricated on Fully Depleted Silicon-on-Insulator
|
216 |
[2010.03.23] Effects of Bulk Microdefects and Metallic Impurities on p-n Junction Leakage Currents in Silicon
|
215 |
[2010.03.08] Role of Hydrogen Peroxide in Alkaline Slurry on the Polishing Rate of Polycrystalline Ge2Sb2Te5 Film in Chemical Mechanical Polishing
|
214 |
[2010.03.04] Effect of Hydroxyethyl Cellulose Concentration on Surface Qualities of Silicon Wafer after Touch Polishing Process
|
213 |
[2010.03.01] Guest Editorial
|
212 |
[2010.01.06] Effect of Organic Additive on Surface Roughness of Polycrystalline Silicon Film after Chemical Mechanical Polishing
|
211 |
[2009.12.10] Effect of Metal-Reflection and Surface-Roughness Properties on Power-Conversion Efficiency for Polymer Photovoltaic Cells
|
210 |
[2009.12.06] Nonvolatile Memory Characteristics of Small-molecule Memory Cells with Electron-transport and Hole-transport Bilayers
|
209 |
[2009.12.06] Effect of Interface Chemical Properties on Nonvolatile Memory Characteristics for Small-molecule Memory Cells Embedded with Ni Nanocrystals Surrounded by NiO
|
208 |
[2009.11.10] Increase in the Adsorption Density of Anionic Molecules on Ceria for Defect-Free STI CMP
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