2001-2005 [2003.10.14] Effects of Abrasive Morphology and Surfactant in Nano-Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
2019.04.20 15:16
Hyun-Goo Kang, Takeo Katoh, Won-Mo Lee, Ungyu Paik and Jea-Gun Park
Effects of Abrasive Morphology and Surfactant in Nano-Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
Chemical Mechanical Planarization VI: Proceedings of the International Symposium, 216