메뉴 건너뛰기

T. W. Kim, K. D. Kwack, J. G. Park, H. S. Lee, J. Y. Lee, M. S. Jang and H. L. Park

 

Correlation between the ordered structure and the valence-band splitting in highly strained CdxZn1-xTe epilayers

 

Appl. Phys. Lett. 83 (2003) 269

번호 제목
87 [2004.04.15] Effects of abrasive size and surfactant in nano ceria slurry for shallow trench isolation file
86 [2004.03.__] 초고집적 반도체 STI 연마 공정용세리아 슬러리의 특성이 나노토포그래피에 미치는 영향
85 [2004.03.01] Effects of Grain Size and Abrasive Size of Polycrystalline Nano-partical Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing file
84 [2004.03.01] Effect of the Nano Ceria Slurry Characteristics on end Point Detection Technology for STI CMP file
83 [2004.02.01] Nanotopography impact and non-prestonian Behavior of ceria slurry in shallow trench isolation chemical mechanical polishing (STI-CMP) file
82 [2004.01.15] Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing file
81 [2003.12.31] Effect of the Abrasive and Additive Concentrations in Nano Ceria Slurry on CMP Pad Temperature
80 [2003.12.12] 나노 세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP 연마판 온도에 미치는 영향 file
79 [2003.10.14] Effects of Abrasive Morphology and Surfactant in Nano-Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
78 [2003.10.14] Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing
77 [2003.09.__] 나노 세리아 슬러리의 양산 공급 시스템
76 [2003.09.29] Effect of Nano-scale Strained Si Grown on SiGe-on-Insulator on Electron Mobility
75 [2003.09.01] Surfactant Effect on Oxide-to-nitride Removal Selectivity of Nano-abrasive Ceria Slurry for Chemical Mechanical Polishing
74 [2003.09.01] Influence of the electrokinetic behaviors of abrasive ceria particles and the deposited plasma-enhanced tetraethylorthosilicate and chemically vapor deposited Si3N4 films in an aqueous medium ...
73 [2003.09.01] Effect of slurry surfactant on nanotopography impact in chemical mechanical polishing