2001-2005 [2001.12.18] The Effect of Si Dissolution on the Stability of Silica Particles and Its Influence on Chemical Mechanical Polishing for Interlayer Dielectrics
2019.04.08 20:34
U. Paik, J. P. Kim, Y. S. Jung, Y. G. Jung, T. Katoh, J. G. Park, V. A. Hackley
The Effect of Si Dissolution on the Stability of Silica Particles and Its Influence on Chemical Mechanical Polishing for Interlayer Dielectrics
J. Korean Phys. Soc. 39 (2001) S201