2001-2005 [2004.08.15] Effect of molecular weight of surfactant in nano ceria slurry on shallow trench isolation chemical mechanical polishing (CMP)
2019.05.02 18:05
Hyun-Goo Kang, Takeo Katoh, Myung-Yoon Lee, Hyung-Soon Park, Ungyu Paik and Jea-Gun Park
Effect of molecular weight of surfactant in nano ceria slurry on shallow trench isolation chemical mechanical polishing (CMP)