2001-2005 [2004.01.15] Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing
2019.05.02 17:51
Hyun-Goo Kang, Takeo Katoh, Won-Mo Lee, Ungyu Paik and Jea-Gun Park
Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing