2001-2005 [2004.02.01] Nanotopography impact and non-prestonian Behavior of ceria slurry in shallow trench isolation chemical mechanical polishing (STI-CMP)
2019.05.02 17:52
Takeo Katoh, Min-Seok Kim, Ungyu Paik and Jea-Gun Park
Nanotopography impact and non-prestonian Behavior of ceria slurry in shallow trench isolation chemical mechanical polishing (STI-CMP)