167 |
[2007.11.04] Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP)
|
166 |
[2007.09.15] Impact of the top silicon thickness on phonon-limited electron mobility in (110)-oriented ultrathin-body silicon-on-insulator n-metal-oxide-semiconductor field-effect transistors
|
165 |
[2007.08.06] Nanotopography Impact of Surfactant Concentration and Molecular Weight of Nano-ceria Slurry on Remaining Oxide Thickness Variation after Shallow Trench Isolation Chemical Mechanical Polishing
|
164 |
[2007.08.06] Effect of Alkaline Agent in Colloidal Silica Slurry for Polycrystalline Silicon Chemical Mechanical Polishing
|
163 |
[2007.07.14] Effects of the Size and the Concentration of the Abrasive in a Colloidal Silica (SiO2) Slurry with Added TMAH on Removal Selectivity of Polysilicon and Oxide Films in Polysilicon Chemical Mechanical Polishing
|
162 |
[2007.06.06] Dependence of Electrical Characteristics on Si Thickness and Ge Concentration for Unstrained Si Grown on Strained SiGe-on-Insulator n-Metal–Oxide–Semiconductor Field-Effect Transistor
|
161 |
[2007.05.22] Influence of Crystalline Structure of Ceria on the Remaining Particles in the STI CMP
|
160 |
[2007.05.15] Effect of O2 Plasma Treatment on Hole-Injection Enhancement for Organic Light-Emitting Devices with Transparent Au:Al Anodes
|
159 |
[2007.05.13] Dependency of Current Conduction Bi-stability on Middle Al Thickness in Organic Bistable Device with Al Nano-crystals Embedded in α-NPD
|
158 |
[2007.03.15] Effects of Abrasive Particle Size and Molecular Weight of poly(acrylic acid) in Ceria Slurry on Removal Selectivity of SiO2/Si3N4 films in Shallow Trench Isolation Chemical Mechanical Planarization
|
157 |
[2007.03.15] Effect of characteristics of nano-colloidal silica abrasives on wafer surface roughness for wafer touch polishing
|
156 |
[2007.02.15] Post-RTA Effect on the Electrical Characteristics of Nano-Scale Strained Si Grown on SiGe-on-Insulator n-MOSFET
|
155 |
[2007.02.15] Characteristics of Dual Emission Using a Thin Semi-Transparent Au Cathode for Organic Light-Emitting Devices
|
154 |
[2007.01.15] Dependency of electrical characteristics on Au nano-crystal size for non-volatile memory fabricated with Au nano-crystal embedded in PVK(poly(N-vinylcarbazole)) layer
|
153 |
[2006.12.26] O2 Plasma Treatment of Al Layer on Metal Anode to Improve the Performance of Organic Light-Emitting Devices
|