199 |
[2009.03.04] Effect of Interface Thickness on Power Conversion Efficiency of Polymer Photovoltaic Cells
|
198 |
[2009.02.17] Comparative study of self-heating effect on electron mobility in nano-scale strained silicon-on-insulator and strained silicon grown on relaxed SiGe-on-insulator n-metal-oxide-semiconductor field-effect transistors
|
197 |
[2009.01.16] Dependence of memory margin of Cap-less memory cell on top Si thickness
|
196 |
[2008.12.02] Surface Polarity and Shape-Controlled Synthesis of ZnO Nanostructures on GaN Thin Films Based on Catalyst-Free Metalorganic Vapor Phase Epitaxy
|
195 |
[2008.12.01] Effect of Abrasive Material Properties on Polishing Rate Selectivity of Nitrogen-doped Ge2Sb2Te5 to SiO2 Film in Chemical Mechanical Polishing
|
194 |
[2008.11.07] The impact of wafer nanotopography on threshold voltage variation in NAND flash memory cells fabricated with poly-silicon chemical mechnical polishing
|
193 |
[2008.10.15] Hole Mobility Enhancement in Strained SiGe Grown on Silicon-on-insulator p-MOSFETs
|
192 |
[2008.09.12] Selectivity Enhancement in the Removal of SiO2 and Si3N4 Films with Addition of Triethanolamine in a Ceria Slurry during Shallow Trench Isolation Chemical Mechanical Polishing
|
191 |
[2008.09.01] Titanium Dioxide Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition for OLED Passivation
|
190 |
[2008.09.01] Crystalline Structure of Ceria Particles Controlled by the Oxygen Partial Pressure and STI CMP Performances
|
189 |
[2008.08.15] Thin Transparent Single-Crystal Silicon Membranes Made Using a Silicon-on-Nitride Wafer
|
188 |
[2008.08.03] Dependency of Power Conversion Efficiency on Donor, Acceptor, and Blocking layer thickness for small-molecular Organic Solar Cell
|
187 |
[2008.07.31] Effect of Alkaline Agent on Polishing Rate of Nitrogen-Doped Ge2Sb2Te5 Film in Chemical Mechanical Polishing
|
186 |
[2008.05.20] Hole Mobility Behavior in Strained SiGe-on-SOI p-MOSFETs
|
185 |
[2008.05.20] Fabrication and Characterization of Organic Light-Emitting Diodes using Transparent Single-Crystal-Silicon Membrane
|
184 |
[2008.05.20] Effect of Organic Amine in Colloidal Silica Slurry on Polishing-Rate Selectivity of Copper to Tantalum-nitride Film in Copper Chemical Mechanical Planarization
|
183 |
[2008.05.20] Effect of Alkaline Agent with Organic Additive in Colloidal Silica Slurry on Polishing Rate Selectivity of Polysilicon-to-SiO2 in Polysilicon CMP
|
182 |
[2008.05.13] Dependence of temperature and self-heating on electron mobility in ultrathin body silicon-on-insulator n -metal-oxide-semiconductor field-effect transistors
|
181 |
[2008.04.18] Silicon thickness fluctuation scattering dependence of electron mobility in ultrathin body silicon-on-insulator n-metal-oxide-semiconductor field-effect transistors
|
180 |
[2008.03.31] Characterization of Organic Light-Emitting Diode (OLED) with Dual Emission using Al:Au Cathode
|