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2001-2005 [2005.04.28] Automatic System and Productivity Elevation

2019.06.26 15:42

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Automatic System and Productivity Elevation

 

NASNIT 2005

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92 [2005.12.__] Comparison of phonon-limited electron mobility in strained Si grown on silicon on insulator (sSOI) and SiGe on insulator (SGOI) file
91 [2005.12.08] The Effect of Cerium Precursor Agglomeration on the Synthesis of Ceria Particles and Its Influence on Shallow Trench Isolation Chemical Mechanical Polishing Performance file
90 [2005.12.02] Investigation of multilayer structural changes in phase and amplitude-defects correction process file
89 [2005.11.09] Agglomerated Large Particles under Various Slurry Preparation Conditions and Their Influence on Shallow Trench Isolation Chemical Mechanical Polishing file
88 [2005.10.27] Development of Dynamic Interface for Sensor
87 [2005.10.15] Influences of pH and concentration of Surfactant on the Electrokinetic Behavior of a Nano-Ceria Slurry in shallow Trench Isolation Chemical Mechanical Polishing file
86 [2005.09.10] Dependency of Phonon-limited Electron Mobility on Si Thickness in strained SGOI  (Silicon Germanium on Insulator) n-MOSFET file
85 [2005.09.01] 차세대 비휘발성 메모리 소자 file
84 [2005.09.01] PoRAM 최근 연구 동향 및 향후 개발 방향 file
83 [2005.07.08] Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing file
82 [2005.06.01] Cu-CMP에서 Alanine이 Cu와 TaN의 선택비에 미치는 영향 file
81 [2005.04.28] Design of Compact PIFA for Mobile Communication Handset
» [2005.04.28] Automatic System and Productivity Elevation
79 [2005.04.01] Slip formation in 300-mm polished and epitaxial silicon wafers annealed by rapid thermal annealing file
78 [2005.03.20] 박재근 PoRAM 최근연구동향 전자공학회지 32권 2호 (2005) 53 file
77 [2005.01.28] Effect of dispersant addition during ceria abrasive milling process on light point defect (LPD) formation after shallow trench isolation chemical mechanical polishing (STI-CMP) file
76 [2005.01.07] Effects of abrasive size and surfactant concentration on the non-prestonian behavior of ceria slurry in shallow trench isolation chemical mechanical polishing file
75 [2004.12.24] STI-CMP용 세리아 슬러리 공급시스템에서 거대입자와 필터 크기가 Light Point Defects(LPDs)에 미치는 영향 (Effects of Large Particles and Filter Size in Central Chemical Supplying (CCS) System for STI-CMP on Light Point Defects (LPDs)) file
74 [2004.12.01] 세리아 슬러리용 Central Chemical Supplying (CCS) 시스템의 필터 크기가 Light Point Defects(LPDs)에 미치는 영향 (Filter Size Effect of Central Chemical Supplying (CCS) system for Ceria Slurry on Light Point Defects (LPDs))
73 [2004.11.__] Characteristics of Ru barrier layer in Mo/Ru/Si multilayer for EUV reflector applications file
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