메뉴 건너뛰기

2001-2005 [2003.07.14] Correlation between the ordered structure and the valence-band splitting in highly strained CdxZn1-xTe epilayers

2019.04.20 15:07

Administrator 조회 수:143

T. W. Kim, K. D. Kwack, J. G. Park, H. S. Lee, J. Y. Lee, M. S. Jang and H. L. Park

 

Correlation between the ordered structure and the valence-band splitting in highly strained CdxZn1-xTe epilayers

 

Appl. Phys. Lett. 83 (2003) 269

이 게시물을
목록
목록
번호 제목
81 [2003.12.31] Effect of the Abrasive and Additive Concentrations in Nano Ceria Slurry on CMP Pad Temperature
80 [2003.12.12] 나노 세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP 연마판 온도에 미치는 영향 file
79 [2003.10.14] Effects of Abrasive Morphology and Surfactant in Nano-Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
78 [2003.10.14] Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing
77 [2003.09.__] 나노 세리아 슬러리의 양산 공급 시스템
76 [2003.09.29] Effect of Nano-scale Strained Si Grown on SiGe-on-Insulator on Electron Mobility
75 [2003.09.01] Surfactant Effect on Oxide-to-nitride Removal Selectivity of Nano-abrasive Ceria Slurry for Chemical Mechanical Polishing
74 [2003.09.01] Influence of the electrokinetic behaviors of abrasive ceria particles and the deposited plasma-enhanced tetraethylorthosilicate and chemically vapor deposited Si3N4 films in an aqueous medium ...
73 [2003.09.01] Effect of slurry surfactant on nanotopography impact in chemical mechanical polishing
72 [2003.07.16] High Selective Nano Ceria Slurry : Abrasive Size and Surfractant Effects
» [2003.07.14] Correlation between the ordered structure and the valence-band splitting in highly strained CdxZn1-xTe epilayers file
70 [2003.06.01] Crystal structures of two variants for CuPtb-type ordering in strained CdxZn1-xTe epilayers file
69 [2003.04.__] 고성능 나노 세리아 슬러리 개발  - 256메가 DRAM급 이상 초고집적 반도체 STI 연마 공정용
68 [2003.04.__] Dependence of crystal nature on the gettering efficiency of iron and nickel in a Czochralski silicon wafer file
67 [2003.03.15] Effects of the physical characteristics of cerium oxide on plasma-enhanced tetraethylorthosiliate removal rate of chemical mechanical polishing for shallow trench isolation file
쓰기
태그