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2001-2005 [2003.12.12] 나노 세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP 연마판 온도에 미치는 영향

2019.04.20 15:17

Administrator 조회 수:117

김성준, Katoh Takeo, 강현구, 김민석, 박재근

 

나노 세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP 연마판 온도에 미치는 영향

 

한국반도체장비학회 2003년도 추계학술대회 논문집, 122

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» [2003.12.12] 나노 세리아 슬러리에 첨가된 연마입자와 첨가제의 농도가 CMP 연마판 온도에 미치는 영향 file
79 [2003.10.14] Effects of Abrasive Morphology and Surfactant in Nano-Ceria Slurry for Shallow Trench Isolation Chemical Mechanical Polishing
78 [2003.10.14] Effect of Slurry Characteristics on Nanotopography Impact in Chemical Mechanical Polishing
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