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2001-2005 [2004.01.15] Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing

2019.05.02 17:51

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Hyun-Goo Kang, Takeo Katoh, Won-Mo Lee, Ungyu Paik and Jea-Gun Park

 

Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing

 

Jpn. J. Appl. Phys. 43 (2004) L1

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» [2004.01.15] Dependence of nanotopography impact on abrasive size and surfactant concentration in ceria slurry for shallow trench isolation chemical mechanical polishing file
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