메뉴 건너뛰기

 

 

Temperature Dependent Electron Beam Induced Current Studies of MOS Capacitor Structures

 

Proceedings of the Symposium on The Degradation of Electronic Device due to Device Operation as well as Crystalline and Process-induced Defects

번호 제목
237 [2011.08.11] p-Type Conduction Characteristics of Lithium-Doped ZnO Nanowires file
236 [2011.07.06] A multi-level capacitor-less memory cell fabricated on a nano-scale strained silicon-on-insulator file
235 [2011.06.15] Effect of the Physical and the Chemical Structures of Ni Nanocrystals on the Nonvolatile Memory Characteristics for Small-molecule Nonvolatile Memory cells Embedded with Ni Nanocrystals file
234 [2011.05.01] Dependence of Ag Film Thickness on Ag Nanocrystals Formation to Fabricate Polymer Nonvolatile Memory file
233 [2011.04.19] Effect of Small-Molecule Layer Thickness on Nonvolatile Memory Characteristics for Small-Molecule Memory-cells file
232 [2011.04.13] Chemical Mechanical Planarization Mechanism for Nitrogen-Doped Polycrystalline Ge2Sb2Te5 Film Using Nitric Acidic Slurry Added with Hydrogen Peroxide file
231 [2011.04.07] Effect of NH4OH Concentration on Surface Qualities of a Silicon Wafer after Final-Touch Polishing file
230 [2011.03.01] Solution-processable fullerene derivatives for organic photovoltaics and n-type thin-film transistors file
229 [2011.03.01] Guest Editorial file
228 [2011.03.01] Dependence of nonvolatile memory characteristics on curing temperature for polymer memory-cell embedded with Au nanocrystals in Poly(N-vinylcarbazole) file
227 [2010.12.20] Micro Defect Size in Si Single Crystal Grown by Czochralski Method file
226 [2010.12.15] Four-level Nonvolatile Small-molecule Memory-Cell Embedded with Fe Nanocrystals Surrounded with FeO and Fe2O3 Tunneling Barrier file
225 [2010.09.24] Fabricated nonvolatile memory with Ag nano-crystals embedded in PVK file
224 [2010.09.23] Potassium Permanganate as Oxidizer in Alkaline Slurry for Chemical Mechanical Planarization of Nitrogen-doped Polycrystalline Ge2Sb2Te5 Film
223 [2010.08.10] Titanium Oxide Thin Films Prepared by Plasma Enhanced Atomic Layer Deposition Using Remote Electron Cyclotron Resonance Plasma for Organic Devices Passivation