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2001-2005 [2005.07.08] Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing

2019.06.26 15:45

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Hyun-Goo Kang, Myung-Yoon Lee, Hyung-Soon Park, Ungyu Paik and Jea-Gun Park

 

Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing

 

Jpn. J. Appl. Phys. 44 (2005) 4752

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