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141 |
[2006.08.15] Monte Carlo study of surface roughness scattering in Si inversion Layer with improved matrix element
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140 |
[2006.07.03] Non-volatile Memory Fabricated with Al Nanocrystals Embedded in Conductive-Low-Molecular-Organic Layers
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139 |
[2006.06.15] Organic Bi-Stable Device Fabricated with a Sandwich Structure of Al / AIDCN / Al Nano-Crystals Surrounded by Amorphous Al2O3 / AIDCN / Al
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138 |
[2006.06.08] Effect of Calcination Process on Synthesis of Ceria Particles, and Its Influence on Shallow Trench Isolation Chemical Mechanical Planarization Performance
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137 |
[2006.05.__] Dependence of Nanotopography Impact on Fumed Silica and Ceria Slurry Added with Surfactant for Shallow Trench Isolation Chemical Mechanical Polishing
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136 |
[2006.05.09] Dependence of Non-Prestonian Behavior of Ceria Slurry with Anionic Surfactant on Abrasive Concentration and Size in Shallow Trench Isolation Chemical Mechanical Polishing
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135 |
[2006.04.__] To Build Efficient Relationship in e-Commerce by CRM
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134 |
[2006.04.__] Study on Development Direction of Construction Industry using RFID
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133 |
[2006.04.01] Effect of the Hydroxyl-Ethyl-Cellulose Concentration in a Silicon Wafer Polishing Slurry on the Wafer Surface Roughness
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132 |
[2006.03.__] Effect of Calcination Time on the Physical Properties of Synthesized Ceria Particles for the Shallow Trench Isolation Chemical Mechanical Planarization Process
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131 |
[2006.02.01] Atomic Force Microscopy Study of the Role of Molecular Weight of Poly(acrylic acid) in Chemical Mechanical Planarization for Shallow Trench Isolation
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130 |
[2005.12.__] Comparison of phonon-limited electron mobility in strained Si grown on silicon on insulator (sSOI) and SiGe on insulator (SGOI)
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129 |
[2005.12.08] The Effect of Cerium Precursor Agglomeration on the Synthesis of Ceria Particles and Its Influence on Shallow Trench Isolation Chemical Mechanical Polishing Performance
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128 |
[2005.12.02] Investigation of multilayer structural changes in phase and amplitude-defects correction process
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127 |
[2005.11.09] Agglomerated Large Particles under Various Slurry Preparation Conditions and Their Influence on Shallow Trench Isolation Chemical Mechanical Polishing
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