2016-2020 [2019.12.01] Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning
2021.08.12 14:26
Plasma Etching of SiO2 with CF3I Gas in Plasma-Enhanced Chemical Vapor Deposition Chamber for In-Situ Cleaning
Jin-Seong Park, In-Sung Park, Seon Yong Kim, Taehoon Lee, Jinho Ahn, Tae-Hun Shim and Jea-Gun Park