2001-2005 [2002.07.01] Abrasive and Surfactant Effects on Ceria Slurry for Chemical Mechanical Polishing in Shallow Trench Isolation
2019.04.08 21:40
Jea-Gun Park, Takeo Katoh, Jin-Hyung Park, Ungyu Paik and Kae-Dal Kwack
Abrasive and Surfactant Effects on Ceria Slurry for Chemical Mechanical Polishing in Shallow Trench Isolation
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA (Rare metal)