2001-2005 [2004.09.__] Effect of nano-scale strained Si layer grown on SiGe-on-insulator structure on MOSFET drain current improvement
2019.05.02 18:07
G.-S. Lee, T.-H. Shim and J.-G. Park
Effect of nano-scale strained Si layer grown on SiGe-on-insulator structure on MOSFET drain current improvement