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STT-MRAM
Spin Neuron
3D ReRAM
ReRAM Based Synaptic Device
CMP Slurry
SiGe Based FinFET
CMOS Image Sensor
QD UV Camera
Thyristor based 1T-DRAM
IZGO FET
Display for Quantum-dots
Solar Cell with Quantum-dots
GaN Substrate
Sapphire Growth
Si Wafer Evaluation for Solar Cell
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[2022.05.15] 첨단 반도체 소재/소자 개발 연구소 스승의 날 행사
[210130] "한국 반도체, 기술 초격차로 중국 따돌리고 대만에 맞서야"
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번호
제목
257
[2013.02.15] Dependence of Nickel Gettering on Crystalline Nature in As-grown Czochralski Silicon Wafer
256
[2013.01.03] Corrosion Inhibitors in Sodium Periodate Slurry for Chemical Mechanical Planarization of Ruthenium Film
255
[2012.12.01] Effect of MeV Nitrogen Ion Implantation on the Resistivity Transition in Czochralski Silicon Wafers
254
[2012.11.27] Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based Slurry
253
[2012.11.14] Nonvolatile Hybrid Memory Cell Embedded with Ni Nanocrystals in Poly(3-hexylthiophene)
252
[2012.09.27] High polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory
251
[2012.09.21] Effect of Slurry pH and H2O2 on Polycrystalline Ge2Sb2Te5 CMP Performance
250
[2012.08.01] Effect of a Thermally Evaporated Bis (2-methyl-8-quninolinato)-4-phenylphenolate Cathode Buffer Layer on the Performance of Polymer Photovoltaic Cells
249
[2012.07.23] Polymer photovoltaic cell embedded with p-type single walled carbon nanotubes fabricated by spray process
248
[2012.04.04] 실리콘 카바이드(SiC) CMP 슬러리의 연구 동향
247
[2012.01.26] Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film
246
[2012.01.18] Effect of Potassium Ferricyanide in the Acid Solution on Performance of Tungsten Chemical Mechanical Planarization
245
[2012.01.13] Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry
244
[2011.12.21] Oxygen Ion Drift-Induced Complementary Resistive Switching in Homo TiOx/TiOy/TiOx and Hetero TiOx/TiON/TiOx Triple Multilayer Frameworks
243
[2011.12.16] Influences of Organic Additive Molecular Weight in Colloidal-Silica-Based Slurry on Final Polishing Characteristics of Silicon Wafer