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257 |
[2013.02.15] Dependence of Nickel Gettering on Crystalline Nature in As-grown Czochralski Silicon Wafer
 |
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256 |
[2013.01.03] Corrosion Inhibitors in Sodium Periodate Slurry for Chemical Mechanical Planarization of Ruthenium Film
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255 |
[2012.12.01] Effect of MeV Nitrogen Ion Implantation on the Resistivity Transition in Czochralski Silicon Wafers
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254 |
[2012.11.27] Effect of Oxidizers on Chemical Mechanical Planarization of Ruthenium with Colloidal Silica Based Slurry
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253 |
[2012.11.14] Nonvolatile Hybrid Memory Cell Embedded with Ni Nanocrystals in Poly(3-hexylthiophene)
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252 |
[2012.09.27] High polishing selectivity ceria slurry for formation of top electrode in spin-transfer torque magnetic random access memory
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251 |
[2012.09.21] Effect of Slurry pH and H2O2 on Polycrystalline Ge2Sb2Te5 CMP Performance
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250 |
[2012.08.01] Effect of a Thermally Evaporated Bis (2-methyl-8-quninolinato)-4-phenylphenolate Cathode Buffer Layer on the Performance of Polymer Photovoltaic Cells
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249 |
[2012.07.23] Polymer photovoltaic cell embedded with p-type single walled carbon nanotubes fabricated by spray process
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248 |
[2012.04.04] 실리콘 카바이드(SiC) CMP 슬러리의 연구 동향
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247 |
[2012.01.26] Effect of Molecular Weight of Polyvinylpyrrolidone on Corrosion-Inhibition Efficiency of Polycrystalline Ge2Sb2Te5 Film
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246 |
[2012.01.18] Effect of Potassium Ferricyanide in the Acid Solution on Performance of Tungsten Chemical Mechanical Planarization
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245 |
[2012.01.13] Study of Ruthenium Oxides Species on Ruthenium Chemical Mechanical Planarization Using Periodate-Based Slurry
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244 |
[2011.12.21] Oxygen Ion Drift-Induced Complementary Resistive Switching in Homo TiOx/TiOy/TiOx and Hetero TiOx/TiON/TiOx Triple Multilayer Frameworks
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243 |
[2011.12.16] Influences of Organic Additive Molecular Weight in Colloidal-Silica-Based Slurry on Final Polishing Characteristics of Silicon Wafer
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