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381 [2025.08.09] Effects of Hydrolysis Reaction and Abrasive Drag Force Accelerator on Enhancing Si-Wafer Polishing Rate and Improving Si-Wafer Surface Roughness
380 [2025.01.22] The Chemical Deformation of a Thermally Cured Polyimide Film Surface into Neutral 1,2,4,5-Benzentetracarbonyliron and 4,4′-Oxydianiline to Remarkably Enhance the Chemical–Mechanical Planarization Polishing Rate file
379 [2025.01.16] Optimization of growth conditions for high-Ge-content Si1-xGex epitaxial layers using ultra-high-vacuum CVD for high-performance semiconductor applications
378 [2024.12.19] Highly reliable forming-free conductive-bridge random access memory via nitrogen-doped GeSe resistive switching layer
377 [2024.10.21] Unveiling the Resistive Switching Mechanism and Low Current Dynamics of Ru-based Hybrid Synaptic Memristors
376 [2024.08.08] Ultraviolet CMOS image sensor for environment analysis via energy-down-shift mechanism of blue-light emitting quantum dots
375 [2024.06.21] Hybrid Organic–Si C-MOSFET Image Sensor Designed with Blue-, Green-, and Red-Sensitive Organic Photodiodes on Si C-MOSFET-Based Photo Signal Sensor Circuit
374 [2024.04.15] Hardware Implementation of a Fully Functional Stochastic p-STT Neuron for Probabilistic Computing
373 [2023.11.22] [Co/NM/Pt]n-based seedless synthetic anti-ferromagnetic layer design for preventing MgO crystallinity degradation from Pt diffusion
372 [2023.11.01] Synaptic variation reduction via embedding Au nanocrystals in resistive switching layer and bottom electrode interface for CuTe/CuO/TiN-stacked synaptic device file
371 [2023.11.01] Extremely high selective Si1−xGex-film wet etchant generating highly dissolved oxygen via peracetic acid oxidant for lateral gate-all-around FETs with a logic node of less than 3-nm
370 [2023.01.18] Fumed Silica-Based Ultra-High-Purity Synthetic Quartz Powder via Sol–Gel Process for Advanced Semiconductor Process beyond Design Rule of 3 nm file
369 [2022.12.13] Simple Ge/Si bilayer junction-based doping-less tunnel field-effect transistor file
368 [2022.11.14] Chemical mechanical planarization mechanism of epitaxially grown Ge-film for sequential integrating 3D-structured transistor cells file
367 [2022.11.04] Silicon Wafer CMP Slurry Using a Hydrolysis Reaction Accelerator with an Amine Functional Group Remarkably Enhances Polishing Rate file