2001-2005 [2001.12.18] Modification of Electrokinetic Behavior of CeO2 Abrasive Particles in Chemical Mechanical Polishing for shallow Trench Isolation
2019.04.08 20:33
J. P. Kim, J. G. Yeo, U. Paik, Y. G. Jung, J. G. Park, V. A. Hackley
Modification of Electrokinetic Behavior of CeO2 Abrasive Particles in Chemical Mechanical Polishing for shallow Trench Isolation
J. Korean Phys. Soc. 39 (2001) S197