2011-2015 [2014.12.01] Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma
2021.08.12 13:59
Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma
Min Hwan Jeon, Ji Youn Youn, Kyung Chae Yang, Deok Hyun Yun, Du Yeong Lee, Tae Hun Shim, Jea Gun Park and Geun Young Yeom