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2011-2015 [2014.12.01] Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma

2021.08.12 13:59

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Etch Characteristics of Magnetic Tunnel Junction Materials Using Bias Pulsing in the CH4/N2O Inductively Coupled Plasma

 

Min Hwan Jeon, Ji Youn Youn, Kyung Chae Yang, Deok Hyun Yun, Du Yeong Lee, Tae Hun Shim, Jea Gun Park and Geun Young Yeom

 

J. Nanosci. Nanotechnol. 14 (2014) 9541

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